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WIS-300 macro defect inspection system

Ø300 mm wafer inspection with bright-field and dark-field imaging in one head. 6.90 µm per pixel across the full wafer, 296 fields per pass.

Resolution
6.90 µm/px
Field of view
16.9 × 14.1 mm
Travel
340 × 385 mm
Footprint
960 × 960 mm
WIS-300 macro defect inspection system, three-quarter view.

Applications

A macro-defect inspector for incoming and outgoing wafer quality. Two channels work on different defect physics: dark field finds anything that scatters, bright field finds anything that changes reflectance. A full Ø300 mm wafer is covered in 296 fields.

Sampling is 6.90 µm per pixel, so features down to about 14 µm are resolved and measured. Below that, dark field still detects — a sub-pixel particle or a hairline crack scatters light and appears as a bright signal against a dark background — but the system reports its position, not its size. It is not a critical-dimension, overlay or film-thickness tool.

Cracks and edge chips
Dark field, confirmed in bright field. Detected at any width; measured above 14 µm. Radial cracks from handling and chips at the bevel are the strongest signals the low-angle ring gives, because a fracture face scatters where flat silicon does not.
Particles and contamination
Dark field. Detected well below the pixel size by the light they scatter, and located to a field; not sized and not classified.
Scratches and handling marks
Dark field. Detected and traced along their length; width measured only above 14 µm.
Residue, stains and watermarks
Bright field. A coaxial channel reads a specular surface as bright and any change in reflectance as a shade, so area defects show without needing to be resolved.
Film and coating uniformity
Bright field, field to field across the wafer. Gross variation and coating misses; not a thickness measurement.
Saw marks and dicing lane defects
Both channels — bright field for the lane itself, dark field for chipping along its edges.
Edge exclusion and bevel condition
Dark field. The ring sits at 63° from the surface normal, a grazing angle well suited to the wafer edge.
Incoming and outgoing gate
Full-wafer pass in 296 fields, 3.9 s of image acquisition.

Inspection

Substrate
Ø300 mm wafer, 0.775 mm nominal thickness (SEMI M1)
Camera
5 MP monochrome CMOS, global shutter, USB3 Vision, C-mount
Resolution
2448 × 2048 pixels, 3.45 µm pixel pitch
Frame rate
75 fps
Optics
Bi-telecentric with integrated coaxial illumination, 0.50×
Field of view
16.89 × 14.13 mm
Sampling
6.90 µm per pixel
Depth of field
2.5 mm
Full-wafer coverage
296 fields, 18 × 22 pattern
Image acquisition
3.9 s per wafer, excluding stage motion

Illumination

Bright field
Coaxial, on the imaging axis
Bright-field source
White, 6000 K
Dark field
Low-angle LED ring
Dark-field wavelength
630 nm
Dark-field incidence
63° from the surface normal
Channel control
Independently switchable

Wafer handling

Chuck
Ø300 mm
Axes
Two, orthogonal, servo driven
X travel
340 mm
Y travel
385 mm
Guideways
Recirculating linear guideways, two rails per axis
Drive
Precision ball screw, fixed and floating end support
Motors
AC servo motor with absolute encoder, one per axis
Coupling
Zero-backlash flexible shaft coupling
Position sensing
Optical home and end-of-travel sensors, both directions
Load height
986 mm above floor level

Enclosure

Upper cover
Full-height, three sided, painted steel
Viewing
Both sides fully glazed in machine-guarding grade clear polycarbonate
Access
Twin front doors, glazed, outward opening
Lower cover
Painted steel, twin doors to the services bay
Services cooling
Filtered forced air on three faces, tool-free replaceable filter elements
Cooling clearance
150 mm on any one ventilated face; the machine may stand against a wall on the others
Working volume
Unventilated by design, so no airflow crosses the substrate
Status indication
Three-tier signal tower, roof mounted
Finish
Matte, low reflectance

Installation

Footprint
960 × 960 mm
Height to cabinet top
1503 mm
Height over signal tower
1718 mm
Mass
491 kg
Levelling
Four adjustable mounts
Front clearance
460 mm for door opening
Camera interface
USB3 Vision
Illumination supply
24 V DC
Services bay
Beneath the work surface, front access
Environment
Indoor, temperature controlled

Views

  • WIS-300 stage and imaging head with the covers removed.
    VI 01Stage and imaging head
  • WIS-300 front elevation.
    VI 02Front elevation
  • WIS-300 right elevation.
    VI 03Right elevation
  • WIS-300 seen from behind at an angle.
    VI 04Rear three-quarter
  • WIS-300 plan view with the roof removed.
    VI 05Plan, roof removed
  • WIS-300 cabinet front detail.
    VI 06Cabinet front

Specifications are subject to change. Dimensions in millimetres.